Keywords: Meetings, students paper awards

 

 

Advanced Equipment Control/Advanced Process Control (AEC/APC) SYMPOSIUM XXI

September 27-30, 2009

Ann Arbor, Michigan

Student Competition

For the 10th year, the AEC/APC Symposium is conducting a competition for student papers. Students from all over the world are invited to participate. The winners will receive an expense-paid trip to the symposium to present their papers.

 


Call for Papers

The symposium will be built around sessions such as (but not limited to) the following topics:

Factory-wide and enterprise-wide applications and deployment

Sensor development, implementation, and integration

Sensor/actuator bus and intelligent sensors

Integrated metrology and virtual metrology

Advanced process control (APC) integration with yield management and design for manufacturability (DFM)

Real-time data collection and data management

Control architecture requirements

Merging APC with other capabilities such as real-time systems, yield, maintenance management, and adaptive scheduling; merging of data associated with these applications

Applications (etch, litho, CVD, PVD, implant)

Fault detection and classification (FDC); fault prediction (FP)

Future APC needs and requirements

Run-to-run, wafer-to-wafer, and real-time control; process modeling and model-based control

Benefits and justification (return on investment, cost of ownership, overall equipment effectiveness

Standards (process control systems, sensorbus, data quality, integrated metrology, EDA, time synchronization)

Tool productivity data collection/analysis

e-diagnostics, e-manufacturing, and equipment engineering capability (EEC)

APC in the next generation factory (NGF)

APC and APC-related advancements in solar, LCD and memory devices industries

APC applications to back-end semiconductor manufacturing

 

 

 Student Competition Guidelines

Applicants must be students who are matriculated in a university or college degree program. A letter or email of support from the student’s faculty advisor should accompany each entered paper.

Only full papers will be considered. Papers are to be limited to four pages, including a one-paragraph abstract.

Abstracts must be submitted electronically using the template provided atwww.aecapcsymposium.org

A panel of industry and university representatives will evaluate the papers. Our target is to accept three to five papers, although the number accepted will depend upon the quality of the submissions.

Abstracts, presentations, papers, posters, and any other material must be non-confidential. Do not submit proprietary information in any materials.

Provide contact information for the author:

• Full name

• College/University

• E-mail

• Phone number

• Fax number

• Mailing address

The International SEMATECH Manufacturing Initiative (ISMI) is solely responsible for accepting or rejecting any submissions.

Due dates

May 22, 2009 Submission Deadline

June 19, 2009 Acceptance Notification

August 14, 2009 Final Presentation Due

August 21, 2009 Presentation Reformatting Due

Professors and other industry professionals (non-students) who wish to submit abstracts should visit www.aecapcsymposium.org for further information.

 

 

S. Joe Qin, Fluor Professor of Process Engineering
The Mork Family Department of Chemical Engineering and Materials Science
Ming Hsieh Department of Electrical Engineering
Daniel J. Epstein Department of Industrial and Systems Engineering
University of Southern California
925 Bloom Walk, HED 211,
Los Angeles, CA 90089-1211